Many variants of thin film technology are nowadays part of the photovoltaic market. The most popular are amorphous silicon, CIS (Copper Indium Selenide)/CIGS (Copper Indium Gallium Selenide)/CIGSS (Copper Indium Gallium Sulphur Selenide), and CdS/CdTe (Cadmium Sulphide/Cadmium-Telluride) cells. All mentioned types allow potentially for a flexible cell structure. Most emitter contacts are currently based on TCOs (Transparent Conductive Oxides), however, wider approach with alternative carbon nanoforms, silver nanolayers and polymer materials, called TCLs (Transparent Conductive Layers) are also in use. Authors decided to investigate influence of mechanical stresses on physical and electrical behaviour of these layers. Consequently, the aim of work is to determine the level and possible mechanisms of flexible a-Si cell parameters degradation due to a deterioration of transparent contact properties.

Al doped ZnO has been explored as a viable alternative to indium thin oxide, which is usually used as transparent electrodes' coverage but is expensive. Homogenous and durable ZnO:Al layers on glass have been obtained in radio frequency magnetron sputtering system by adjusting optimized deposition parameters, using ZnO ceramic target with 2 wt% Al₂O₃. Then, after growth process, annealing treatment has been introduced in order to improve the quality of the layers. Structural, electrical and optical properties of the obtained ZnO:Al layers are presented and discussed. From the application point of view, the best results (sheet resistance of 24 Ω/sq and transparency well above 85%) were achieved after annealing in 300°C.