Details

Title

Growth Temperature Effect of Atomic-Layer-Deposited GdOx Films

Journal title

Archives of Metallurgy and Materials

Yearbook

2021

Volume

vol. 66

Issue

No 3

Affiliation

Ryu, Sung Yeon : Seoul National University of Science and Technology, Department of Material Science and Engineering, Seoul 01811, Korea ; Yun, Hee Ju : Seoul National University of Science and Technology, Department of Material Science and Engineering, Seoul 01811, Korea ; Lee, Min Hwan : University of California Merced, Department of Mechanical Engineering, Merced, California, USA ; Choi, Byung Joon : Seoul National University of Science and Technology, Department of Material Science and Engineering, Seoul 01811, Korea

Authors

Keywords

gadolinium oxide (Gd2O3) ; rare-earth oxide ; atomic layer deposition ; hydrophobicity ; electrical property

Divisions of PAS

Nauki Techniczne

Coverage

755-758

Publisher

Institute of Metallurgy and Materials Science of Polish Academy of Sciences ; Committee of Materials Engineering and Metallurgy of Polish Academy of Sciences

Bibliography

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[3] G . Azimi, R. Dhiman, H.M. Kwon, A.T. Paxson, K.K. Varanasi, Nature Materials 12, 315 (2013).
[4] I .K. Oh, K. Kim, Z. Lee, K.Y. Ko, C.W. Lee, S.J. Lee, J.M. Myung, C. Lansalot-Matras, W. Noh, C. Dussarrat, H. Kim, H.B.R. Lee, Chemistry of Materials 27, 148 (2015).
[5] M. Leskelä, K. Kukli, M. Ritala, Journal of Alloys and Compounds 418, 27 (2006).
[6] J.H. Han, A. Delabie, A. Franquet, T. Conard, S. van Elshocht, C. Adelmann, Chemical Vapor Deposition 21, 352 (2015).
[7] S. Govindarajan, T.S. Böscke, P. Sivasubramani, P.D. Kirsch, B.H. Lee, H.H. Tseng, R. Jammy, U. Schröder, S. Ramanathan, B.E. Gnade, Applied Physics Letters 91, 062906 (2007).
[8] H. Kim, H.J. Yun, B.J. Choi, RSC Advances 8, 42390 (2018).
[9] J.H. Shim, G.D. Han, H.J. Choi, Y. Kim, S. Xu, J. An, Y.B. Kim, T. Graf, T.D. Schladt, T.M. Gür, F.B. Prinz, International Journal of Precision Engineering and Manufacturing - Green Technology 6, 629 (2019).
[10] K. Xu, R. Ranjith, A. Laha, H. Parala, A.P. Milanov, R.A. Fischer, E. Bugiel, J. Feydt, S. Irsen, T. Toader, C. Bock, D. Rogalla, H.J. Osten, U. Kunze, A. Devi, Chemistry of Materials 24, 651 (2012).
[11] C. Adelmann, H. Tielens, D. Dewulf, A. Hardy, D. Pierreux, J. Swerts, E. Rosseel, X. Shi, M.K. van Bael, J.A. Kittl, S. van Elshocht, Journal of The Electrochemical Society 157, G105 (2010).
[12] D. Kim, D. Ha Kim, D.H. Riu, B.J. Choi, Archives of Metallurgy and Materials 63, 1061 (2018).
[13] M. Mishra, P. Kuppusami, S. Ramya, V. Ganesan, A. Singh, R. Thirumurugesan, E. Mohandas, Surface and Coatings Technology 262, 56 (2015).
[14] N.K. Sahoo, M. Senthilkumar, S. Thakur, D. Bhattacharyya, Applied Surface Science 200, 219 (2002).

Date

2021.09.06

Type

Article

Identifier

DOI: 10.24425/amm.2021.136375

Source

Archives of Metallurgy and Materials
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