Title

The Al2O3/TiO2 double antireflection coating deposited by ALD method

Journal title

Opto-Electronics Review

Yearbook

2022

Volume

30

Issue

3

Affiliation

Szindler, Marek : Scientific and Didactic Laboratory of Nanotechnology and Material Technologies, Faculty of Mechanical Engineering, Silesian University of Technology, 7 Towarowa St., 44-100 Gliwice, Poland ; Szindler, Magdalena M. : Department of Engineering Materials and Biomaterials, Silesian University of Technology, 18a Konarskiego St., 44-100 Gliwice, Poland ; Orwat, Justyna : Department of Mining, Safety Engineering and Industrial Automation, Silesian University of Technology, 2 Akademicka St., 44-100 Gliwice, Poland ; Kulesza-Matlak, Grażyna : Institute of Metallurgy and Materials Science of Polish Academy of Sciences, 25 Reymonta St., 30-059 Krakow, Poland

Authors

Szindler, Marek ; Szindler, Magdalena M. ; Orwat, Justyna ; Kulesza-Matlak, Grażyna

Keywords

antireflection coating ; atomic layer deposition method ; solar cells

Divisions of PAS

Nauki Techniczne

Coverage

e141952

Publisher

Polish Academy of Sciences (under the auspices of the Committee on Electronics and Telecommunication) and Association of Polish Electrical Engineers in cooperation with Military University of Technology

Date

27.09.2022

Type

Article

Identifier

DOI: 10.24425/opelre.2022.141952