Details
Title
Application of Al 2O 3 ZnO, and TiO 2 ALD thin films as antireflection coating in the silicon solar cellsJournal title
Opto-Electronics ReviewYearbook
2023Volume
31Issue
4Authors
Affiliation
Szindler, Marek : Scientific and Didactic Laboratory of Nanotechnology and Material Technologies, Faculty of Mechanical Engineering, Silesian University of Technology, ul. Towarowa 7, 44-100 Gliwice, Poland ; Szindler, Magdalena M. : Department of Engineering Materials and Biomaterials, Faculty of Mechanical Engineering, Silesian University of Technology, ul. Konarskiego 18a, 44-100 Gliwice, PolandKeywords
optical thin film ; antireflection coating ; atomic layer deposition ; solar cellsDivisions of PAS
Nauki TechniczneCoverage
e148223Publisher
Polish Academy of Sciences (under the auspices of the Committee on Electronics and Telecommunication) and Association of Polish Electrical Engineers in cooperation with Military University of TechnologyDate
05.11.2023Type
ArticleIdentifier
DOI: 10.24425/opelre.2023.148223Abstracting & Indexing
Abstracting and Indexing:Arianta
BazTech
EBSCO relevant databases
EBSCO Discovery Service
SCOPUS relevant databases
ProQuest relevant databases
Clarivate Analytics relevant databases
WangFang
additionally:
ProQuesta (Ex Libris, Ulrich, Summon)
Google Scholar