Szczegóły

Tytuł artykułu

Optimization of the dynamical behavior of high-performance lens systems to reduce dynamic aberrations

Tytuł czasopisma

Archive of Mechanical Engineering

Rocznik

2011

Wolumin

vol. 58

Numer

No 4

Autorzy

Słowa kluczowe

multibody systems ; raytracing method ; coupled dynamical-optical simulation methods ; multidisciplinary optimization

Wydział PAN

Nauki Techniczne

Zakres

407-423

Wydawca

Polish Academy of Sciences, Committee on Machine Building

Data

2011

Typ

Artykuły / Articles

Identyfikator

DOI: 10.2478/v10180-011-0025-3 ; ISSN 0004-0738, e-ISSN 2300-1895

Źródło

Archive of Mechanical Engineering; 2011; vol. 58; No 4; 407-423

Referencje

Mack C. (2007), Fundamental Principles of Optical Lithography, doi.org/10.1002/9780470723876 ; Schriever M., Wegmann U., Hembacher S., Geuppert B., Huber J., Kerwien N., Totzeck M., Hauf M.: Optical Apparatus and Method for Modifying the Image Behavior of such Apparatus. Patent US 2009/0174876, 2009. ; Shibazaki Y.: Optical Element Holding Apparatus. Patent US 2007/0121224, 2007. ; Schiehlen W. (2004), Technische Dynamik - Modelle für Regelung und Simulation. ; Born M. (1999), Principles of Optics. ; Zernike F. (1934), Beugungstheorie des Schneidenverfahrens und seiner verbesserten Form, der Phasenkontrastmethode (in German), Physica, 1, 689, doi.org/10.1016/S0031-8914(34)80259-5 ; Noll R. (1976), Zernike Polynomials and Atmospheric Turbulence, Journal of the Optical Society in America, 66, 3, 207, doi.org/10.1364/JOSA.66.000207 ; Sedlaczek K. (2006), Using Augmented Lagrangian Particle Swarm Optimization for Unconstrained Problems in Engineering, Structural and Multidiscipinary Optimization, 32, 4, 277, doi.org/10.1007/s00158-006-0032-z ; Sedlaczek K. (2007), Augmented Lagrangian Particle Swarm Optimization in Mechanism Design, Journal of System Design and Dynamics, 1, 410, doi.org/10.1299/jsdd.1.410 ; Kennedy J. (2001), Swarm Intelligence. ; Schittkowski K. (1985), NLPQL: A Fortran Subroutine Solving Constrained Nonlinear Programming Problems, Annals of Operations Research, 5, 485. ; Ulrich W., Rostalski H. J.: Projection Objective for Immersion Lithography. Patent US 2010/0323299, 2010.
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