Details
Title
Analysis of the impact of post-process modifications on the properties of TiO2 thin films with high-temperature stable anatase phase deposited by the electron beam evaporation methodJournal title
Opto-Electronics ReviewYearbook
2024Volume
32Issue
4Authors
Affiliation
Obstarczyk, Agata : Faculty of Electronics, Photonics and Microsystems, Wroclaw University of Science & Technology, ul. Janiszewskiego 11/17, 50-372 Wroclaw, Poland ; Mańkowska, Ewa : Faculty of Electronics, Photonics and Microsystems, Wroclaw University of Science & Technology, ul. Janiszewskiego 11/17, 50-372 Wroclaw, Poland ; Weichbrodt, Wiktoria : Faculty of Electronics, Photonics and Microsystems, Wroclaw University of Science & Technology, ul. Janiszewskiego 11/17, 50-372 Wroclaw, Poland ; Kapuścik, Paulina : Faculty of Electronics, Photonics and Microsystems, Wroclaw University of Science & Technology, ul. Janiszewskiego 11/17, 50-372 Wroclaw, Poland ; Kijaszek, Wojciech : Faculty of Electronics, Photonics and Microsystems, Wroclaw University of Science & Technology, ul. Janiszewskiego 11/17, 50-372 Wroclaw, Poland ; Mazur, Michał : Faculty of Electronics, Photonics and Microsystems, Wroclaw University of Science & Technology, ul. Janiszewskiego 11/17, 50-372 Wroclaw, PolandKeywords
post-process annealing ; electron beam evaporation ; TiO2 ; coating ; high-temperature stable anataseDivisions of PAS
Nauki TechniczneCoverage
e151991Publisher
Polish Academy of Sciences (under the auspices of the Committee on Electronics and Telecommunication) and Association of Polish Electrical Engineers in cooperation with Military University of TechnologyDate
15.10.2024Type
ArticleIdentifier
DOI: 10.24425/opelre.2024.151991Abstracting & Indexing
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